Analysis of the production of the CH(A2Δ) state from the dissociative excitation of tetramethylsilane in the electron-cyclotron resonance plasma of Ar: The H2O-addition method-Reference-Cited by-同舟云学术

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Analysis of the production of the CH(A2Δ) state from the dissociative excitation of tetramethylsilane in the electron-cyclotron resonance plasma of Ar: The H2O-addition method

Published:2014-01-01 Issue:3S2 Volume:53 Page:03DC01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ito Haruhiko,Gappa Rie

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference41 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Spectroscopy of Low Temperature Plasma

3. SiC synthesis by a plasma deposition process

4. Amorphous hydrogenated SiC from a low power discharge of SiH4-C2H2 mixture

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Production of CH(A2Δ) radicals from the dissociative excitation reaction of C2H2with microwave discharge flow of Ar;Japanese Journal of Applied Physics;2015-05-29

2. Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar;Plasma Chemistry and Plasma Processing;2014-02-12

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