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Production of Dual-Frequency Sputtering Plasma for Preparation of Aluminum Nitride Thin Film

  • Published:2011 Issue:1 Volume:36 Page:99-102
  • ISSN:1382-3469
  • Container-title:Transactions of the Materials Research Society of Japan
  • language:en
  • Short-container-title:Trans. Mat. Res. Soc. Japan

Author:

Ohtsu Y.1,Hino K.1,Misawa T.1,Akiyama M.2,Yukimura K.345

Affiliation:

1. Department of Electrical and Electrical Engineering, Saga University

2. Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology

3. School of Materials Science and Engineering, Harbin Institute of Technology

4. School of Materials Science and Engineering, Southwest Jiatong University

5. Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology(AIST)

Publisher

The Materials Research Society of Japan

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