Effects of Forest Clearcut and Afforestation on Streamwater Chemistry in Japanese Cedar (Cryptomeria japonica) Forests: Comparison among Watersheds of Various Stand Ages.
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Publisher
The Japanese Forest Society
Reference62 articles.
1. Effects of land use, climate variation, and N deposition on N cycling and C storage in northern hardwood forests
2. Inorganic Nitrogen Losses from a Forested Ecosystem in Responseto Physical, Chemical, Biotic,and Climatic Perturbations
3. 浅野友子.大手信人.内田太郎.勝山正則 (1999) H+ 収支を用いた森林植生が酸中和機構に与える影響の評価.日林誌81: 178-186.
4. Early Regeneration of a Clear-Cut Southern Appalachian Forest
5. Bormann, F.H. and Likens, G.E. (1979) Pattern and process in a forested ecosystem. Second ed. Springer-Verlag New York Inc., New York.
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2. Distribution of amphipods (Gammarus nipponensisUeno) among mountain headwater streams with different legacies of debris flow occurrence;Ecohydrology;2012-01-17
3. Soil nitrogen dynamics during stand development after clear-cutting of Japanese cedar (Cryptomeria japonica) plantations;Journal of Forest Research;2011-10
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