Potential sensitivities in frequency modulation and heterodyne amplitude modulation Kelvin probe force microscopes-Reference-Cited by-同舟云学术

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Potential sensitivities in frequency modulation and heterodyne amplitude modulation Kelvin probe force microscopes

Published:2013-12 Issue:1 Volume:8 Page:
ISSN:1556-276X
Container-title:Nanoscale Research Letters
language:en
Short-container-title:Nanoscale Res Lett

Author:

Ma Zong-Min,Mu Ji-Liang,Tang Jun,Xue Hui,Zhang Huan,Xue Chen-Yang,Liu Jun,Li Yan-Jun

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics,General Materials Science

Link

http://link.springer.com/content/pdf/10.1186/1556-276X-8-532.pdf

Reference21 articles.

1. Nonnenmacher M, O’Boyle MP, Wickramasinghe HK: Kelvin probe force microscopy. Appl Phys Lett 1991, 58: 2921–2923. 10.1063/1.105227

2. Eguchi T, Fujikawa Y, Akiyama K, An T, Ono M, Hashimoto T, Morikawa Y, Terakura K, Sakurai T, Lagally MG, Hasegawa Y: Imaging of all dangling bonds and their potential on the Ge/Si (105) surface by noncontact atomic force microscopy. Phys Rev Lett 2004, 93: 266102–266105.

3. Sadewasser S, Jelinek P, Fang C-K, Custance O, Yamada Y, Sugimoto Y, Abe M, Morita S: New insights on atomic-resolution frequency-modulation Kelvin-probe force-microscopy imaging of semiconductors. Phys Rev Lett 2009, 103: 266103–266105.

4. Kawai S, Glatzel T, Hug HJ, Meyer E: Atomic contact potential variations of Si (111)-7x7 analyzed by Kelvin probe force microscopy. Nanotechnology 2010, 21: 245704. 1–9 1–9 10.1088/0957-4484/21/24/245704

5. Bocquet F, Nony L, Loppacher C, Glatzel T: Analytical approach to the local contact potential difference on (001) ionic surfaces: implications for Kelvin probe force microscopy. Phys Rev B 2008, 78: 035410. 1–13 1–13

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