Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si-Reference-Cited by-同舟云学术

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Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si

Published:2011-05-31 Issue:1 Volume:6 Page:
ISSN:1556-276X
Container-title:Nanoscale Research Letters
language:en
Short-container-title:Nanoscale Res Lett

Author:

El-Atwani Osman,Ortoleva Sami,Cimaroli Alex,Allain Jean Paul

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics,General Materials Science

Link

http://link.springer.com/content/pdf/10.1186/1556-276X-6-403.pdf

Reference19 articles.

1. Facsko S, Dekorsy T, Koerdt C, Trappe C, Kurz H, Vogt A, Hartnagel HL: Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering. Science 1999, 285: 1551. 10.1126/science.285.5433.1551

2. Hanisch A, Biermanns A, Grenzer J, Facsko S, Pietsch U: Xe ion beam induced rippled structures on differently oriented single-crystalline Si surfaces. J Phys D: Appl Phys 2010, 43: 112001. 10.1088/0022-3727/43/11/112001

3. Chappert C, Bernas H, Ferre J, Kottler V, Jamet JP, Chen Y, Cambril E, Devolder T, Rousseaux F, Mathet V, Launois H: Planar Patterned Magnetic Media Obtained by Ion Irradiation. Science 1998, 280: 1919. 10.1126/science.280.5371.1919

4. Gago R, Vazquez L, Cuerno R, Varela M, Ballesteros C, Albella JM: Production of ordered silicon nanocrystals by low-energy ion sputtering. Appl Phys Lett 2001, 78: 3316. 10.1063/1.1372358

5. Ozaydin G, Özcan AS, Wang Y, Ludwig KF, Zhou H, Headrick RL, Siddons DP: Real-time x-ray studies of Mo-seeded Si nanodot formation during ion bombardment. Appl Phys Lett 2005, 87: 163104. 10.1063/1.2099521

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