Author:
Termentzidis Konstantinos,Parasuraman Jayalakshmi,Da Cruz Carolina Abs,Merabia Samy,Angelescu Dan,Marty Frédéric,Bourouina Tarik,Kleber Xavier,Chantrenne Patrice,Basset Philippe
Publisher
Springer Science and Business Media LLC
Subject
Condensed Matter Physics,General Materials Science
Reference34 articles.
1. Marty F, Rousseau L, Saadany B, Mercier B, Francais O, Mita Y, Bourouina T: Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. Microelectronics Journal 2005, 36(Issue 7):673–677. 10.1016/j.mejo.2005.04.039
2. Mita I, Kubota M, Sugiyama M, Marty F, Bourouina T, Shibata T: Aspect Ratio Dependent Scalloping Attenuation in DRIE and an Application to Low-Loss Fiber-Optical Switch. In Proc. of IEEE International Conference on MicroElectroMechanical Systems (MEMS 2006). Istanbul, Turkey; 2006:114–117.
3. Kapitza PL: J Phys. Volume 4. (Moscow); 1941:181.
4. Register RA, Angelescu D, Pelletier V, Asakawa K, Wu MW, Adamson DH, Chaikin PM: Shear-Aligned Block Copolymer Thin Films as Nanofabrication Templates. Journal of Photopolymer Science and Technology 2007, 20: 493. 10.2494/photopolymer.20.493
5. Hannay NB: Semiconductors. Reinhold: New York; 1959.
Cited by
44 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献