Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications-Reference-Cited by-同舟云学术

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Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications

Published:2013-02-15 Issue:1 Volume:8 Page:
ISSN:1556-276X
Container-title:Nanoscale Research Letters
language:en
Short-container-title:Nanoscale Res Lett

Author:

Ding Shi-Jin,Chen Hong-Bing,Cui Xing-Mei,Chen Sun,Sun Qing-Qing,Zhou Peng,Lu Hong-Liang,Zhang David Wei,Shen Chen

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics,General Materials Science

Link

http://link.springer.com/content/pdf/10.1186/1556-276X-8-80.pdf

Reference23 articles.

1. Gu DF, Baumgart H, Tapily K, Shrestha P, Namkoon1 G, Ao XY, Müller F: Precise control of highly ordered arrays of nested semiconductor/metal nanotubes. Nano Res 2011, 4: 164–170. 10.1007/s12274-010-0066-9

2. Jiang XR, Huang H, Prinz FB, Bent SF: Application of atomic layer deposition of platinum to solid oxide fuel cells. Chem Mater 2008, 20: 3897–3905. 10.1021/cm7033189

3. Liu C, Wang CC, Kei CC, Hsueh YC, Perng TP: Atomic layer deposition of platinum nanoparticles on carbon nanotubes for application in proton-exchange membrane fuel cells. Small 2009, 5: 1535–1538. 10.1002/smll.200900278

4. Yang DQ, Zhang GX, Sacher E: Evidence of the interaction of evaporated Pt nanoparticles with variously treated surfaces of highly oriented pyrolytic graphite. J Phys Chem B 2006, 110: 8348–8356. 10.1021/jp060513d

5. Singh PK, Bisht G, Auluck K, Sivatheja M, Hofmann R, Singh KK, Mahapatra S: Performance and reliability study of single-layer and dual-layer platinum nanocrystal flash memory devices under NAND operation. IEEE Trans Electron Devices 2010, 57: 1829–1837.

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