Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment-Reference-Cited by-同舟云学术

Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment

Published:2012-03-08 Issue:1 Volume:7 Page:
ISSN:1556-276X
Container-title:Nanoscale Research Letters
language:en
Short-container-title:Nanoscale Res Lett

Author:

Wang I-Shun,Lin Yi-Ting,Huang Chi-Hsien,Lu Tseng-Fu,Lue Cheng-En,Yang Polung,Pijanswska Dorota G,Yang Chia-Ming,Wang Jer-Chyi,Yu Jau-Song,Chang Yu-Sun,Chou Chien,Lai Chao-Sung

Abstract

Abstract Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics,General Materials Science

Link

https://link.springer.com/content/pdf/10.1186/1556-276X-7-179.pdf

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