Diffusion of Boron in Cobalt Sinters

Abstract

Abstract The paper describes the process of diffusion taking place at the surface of sinters produced from Co Extrafine powder after saturation with boron. Boronizing was performed at a temperature of 950°C for 6 and 12 hours by applying B4C powder as a depositing source, NH4Cl + NaF as an activator and Al2O3 as an inert filler. The study involved determining the diffusion coefficient, which required analyzing the microstructure and thickness of the layers and the process time. The images obtained with a Leica DM-4000 optical microscope revealed a two-phase structure of the boride layers. The presence of the two phases, i.e. CoB and Co2B, was confirmed by X-ray diffraction (XRD). A model of diffusion of boron atoms into the cobalt substrate was developed assuming the reaction diffusion mechanism. This model was used to calculate the diffusion coefficient. It required taking account of the interatomic potentials of boron and cobalt. The calculation results were compared with the experimental data concerning the diffusion of boron in other materials.