AFM examination of nanolayers synthesised by the molecular layering method on the surface of manufacturing glasses-Reference-Cited by-同舟云学术

AFM examination of nanolayers synthesised by the molecular layering method on the surface of manufacturing glasses

Published:2007-05 Issue:5 Volume:41 Page:498-501
ISSN:1063-7826
Container-title:Semiconductors
language:en
Short-container-title:Semiconductors

Author:

Sosnov E. A.,Dorofeev V. P.,Malkov A. A.,Malygin A. A.,Kulikov N. A.,Brusilovsky G. L.

Publisher

Pleiades Publishing Ltd

Subject

Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1134/S1063782607050028.pdf

Reference21 articles.

1. S. A. Ivanov and G. A. Shchukin, X-Ray Tubes of Engineering Purpose (Énergoatomizdat, Leningrad, 1989) [in Russian].

2. V. D. Bochkov, Elektron. Tekh., Ser. 4: Elektrovak. Gazorazryad. Prib., No.2(85), 11 (1981).

3. V. D. Bochkov and M. M. Pogorel’skiĭ, Zh. Tekh. Fiz. 69(6), 30 (1999) [Tech. Phys. 44, 636 (1999)].

4. V. D. Bochkov, M. M. Pogorel’skiĭ, and P. V. Poshekhonov, Elektron. Tekh., Ser. 4: Elektrovak. Gazorazryad. Prib., No. 5, 50 (1977).

5. V. D. Bochkov, G. N. Petrov, M. M. Pogorel’skiĭ, and P. V. Poshekhonov, Electron. Tekh., Ser. 4: Elektrovak. Gazorazryad. Prib., No. 2(85), 26 (1981).

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition of chromium oxide—An interplay between deposition and etching;Journal of Vacuum Science & Technology A;2021-05

2. From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition;Chemical Vapor Deposition;2015-12

3. Structural and chemical transformations in the products of the interaction of silica gel with vapours of TiCl4 and H2O;Applied Surface Science;2014-01

4. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends;Journal of Applied Physics;2013-01-14

5. Phase transformations in titanium dioxide thin films during chemical synthesis under strongly nonequilibrium conditions;Physics of the Solid State;2009-03