1. L. Aleksandrov, Thin Films Sci. Technol. 5, 233 (1984).
2. S. Murarka, Silicides for VLSI Applications (Academic, New York, 1983; Mir, Moscow, 1986).
3. J. Pelleg, S. Zalkind, L. Zevin, and B. M. Ditchek, Thin Solid Films 249, 126 (1994).
4. I. Belousov, A. Grib, S. Linzen, and P. Seidel, Nucl. Instrum. Methods Phys. Res. B 186, 61 (2002).
5. V. Yu. Balandin, A. V. Dvurechenskiĭ, and L. N. Aleksandrov, Poverkhnost: Fiz. Khim. Mekh., No. 1, 53 (1986).