Plasma technologies for material processing in nanoelectronics: Problems and solutions-Reference-Cited by-同舟云学术

Plasma technologies for material processing in nanoelectronics: Problems and solutions

Published:2017-05 Issue:5 Volume:62 Page:454-465
ISSN:1064-2269
Container-title:Journal of Communications Technology and Electronics
language:en
Short-container-title:J. Commun. Technol. Electron.

Author:

Shustin E. G.

Publisher

Pleiades Publishing Ltd

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Radiation,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1134/S106422691704012X.pdf

Reference77 articles.

1. M. A. Lieberman, in Proc. 27th Int. Conf. on Phenomena in Ionised Gases (ICPIG), Eindhoven, Netherlands, Yuly 18–22, 2005, (Eindhoven Univ. Technol., Eindhoven, 2006), Rep. 6.

2. F. Schwierz, Nature Nanotechnol. 5, 487 (2010).

3. S. Samukawa, M. Hori, S. Rauf, et al., J. Phys. D: Appl. Phys. 45, 253001 (2012).

4. K. Hashimoto, Jpn. J. Appl. Phys. 32, 6109 (1993).

5. K. P. Cheung, Plasma Charging Damage (Springer-Verlag, Heidelberg, 2000).

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