Hydrogenated silicon oxycarbonitride films. Part III. Thermodynamic modeling of the Si-C-N-O-H system
Author:
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites
Link
http://link.springer.com/content/pdf/10.1134/S1087659615030062.pdf
Reference17 articles.
1. Fainer, N.I., From organosilicon precursors to multifunctional silicon carbonitride, Russ. J. Gen. Chem., 2012, vol. 82, no. 1, pp. 43–52.
2. Fainer, N.I., Golubenko, A.N., Rumyantsev, Yu.M., Kesler, V.G., Ayupov, B.M., Rakhlin, V.I., and Voronkov, M.G., Tris(diethylamino)silane-A new precursor compound for obtaining layers of silicon carbonitride, Glass Phys. Chem., 2012, vol. 38, no. 1, pp. 15–26.
3. Fainer, N.I., Golubenko, A.N., Rumyantsev, Yu.M., Kesler, V.G., Maksimovskii, E.A., Ayupov, B.M., and Kuznetsov, F.A., Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane, Glass Phys. Chem., 2013, vol. 39, no. 1, pp. 77–88.
4. Zhang, D.H., Gao, Y., Wei, J., and Mo, Z.Q., Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECRCVD, Thin Solid Films, 2000, vols. 377–378, pp. 607–610.
5. Chen, K.H., Wu, J.-J., Wen, C.Y., Chen, L.C., Fan, C.W., Kuo, P.F., Chen, Y.F., and Huang, Y.S., Wide-band-gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition, Thin Solid Films, 1999, vols. 355–356, pp. 205–209.
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3