Formation of a Deep Surface Relief in Photo-Sensitive Silicate Glasses
Author:
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites
Link
https://link.springer.com/content/pdf/10.1134/S1087659622600351.pdf
Reference13 articles.
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2. Margulis, W. and Laurell, F., Interferometric study of poled glass under etching, Opt. Lett., 1996, vol. 21, pp. 1786–1788.
3. Reduto, I., Kamenskii, A., Brunkov, P., Zhurikhina, V., Svirko, Y., and Lipovskii, A., Relief micro- and nanostructures by the reactive ion and chemical etching of poled glasses, Opt. Mater. Express, 2019, vol. 9, pp. 3059–3068.
4. Takagi, H., Miyazawa, S., Takahashi, M., and Maeda, R., Electrostatic imprint process for glass, Appl. Phys. Express, 2008, vol. 1, 024003.
5. Ikutame, N., Kawaguchi, K., Ikeda, H., Sakai, D., Harada, K., Funatsu, S., and Nishii, J., Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching, J. Appl. Phys., 2013, vol. 114, 083514.
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