Author:
Belokopytov G. V.,Ryzhkova Yu. V.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference60 articles.
1. Rai-Choudhuri, P., Handbook of Microlithography, Micromachining, and Microfabrication, vol. 1: Microlithography, Bellingham: SPIE Optical Engineering Press, 1997.
2. Thompson, L.F., Willson, C.G., and Bowden, M.J., Introduction to Microlithography, Washington, DC, 1994.
3. Levinson, H.J., Extreme Ultraviolet Lithography’s Path to Manufacturing, J. Micro/Nanolith. MEMS MOEMS, 2009, vol. 8, no. 4, p. 041501.
4. Wieland, M.J., Boer, G., et al., MAPPER: High Throughput Maskless Lithography, Proc. SPIE, 2009, vol. 7271, p. 72710O.
5. Manakli, S., Komami, H., et al., Cell Projection Use in Mask-Less Lithography for 45 nm & 32 nm Logic Nodes, Proc. SPIE, 2009, vol. 7271, p. 72710K.
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