Optical maskless lithography

Author:

Belokopytov G. V.,Ryzhkova Yu. V.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference60 articles.

1. Rai-Choudhuri, P., Handbook of Microlithography, Micromachining, and Microfabrication, vol. 1: Microlithography, Bellingham: SPIE Optical Engineering Press, 1997.

2. Thompson, L.F., Willson, C.G., and Bowden, M.J., Introduction to Microlithography, Washington, DC, 1994.

3. Levinson, H.J., Extreme Ultraviolet Lithography’s Path to Manufacturing, J. Micro/Nanolith. MEMS MOEMS, 2009, vol. 8, no. 4, p. 041501.

4. Wieland, M.J., Boer, G., et al., MAPPER: High Throughput Maskless Lithography, Proc. SPIE, 2009, vol. 7271, p. 72710O.

5. Manakli, S., Komami, H., et al., Cell Projection Use in Mask-Less Lithography for 45 nm & 32 nm Logic Nodes, Proc. SPIE, 2009, vol. 7271, p. 72710K.

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1. Optimization and characterization of direct UV laser writing system for microscale applications;Journal of Micromechanics and Microengineering;2020-06-22

2. Maskless lithography of silazanes for fabrication of ceramic micro-components;Ceramics International;2019-02

3. Maskless X-Ray Lithography Based on Microoptical Electromechanical Systems and Microfocus X-Ray Tubes;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2018-09

4. Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11

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