Atomic and electronic structure of amorphous and nanocrystalline layers of semi-insulating silicon produced by chemical-vapor deposition at low pressures-Reference-Cited by-同舟云学术

Atomic and electronic structure of amorphous and nanocrystalline layers of semi-insulating silicon produced by chemical-vapor deposition at low pressures

Published:2015-11 Issue:6 Volume:9 Page:1228-1236
ISSN:1027-4510
Container-title:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Domashevskaya E. P.,Terekhov V. A.,Turishchev S. Yu.,Prijimov A. S.,Kharin A. N.,Parinova E. V.,Rumyantseva N. A.,Usoltseva D. S.,Fomenko Yu. L.,Belenko S. V.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

http://link.springer.com/content/pdf/10.1134/S1027451015060257.pdf

Reference21 articles.

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