Mobility restriction of charge carriers in bismuth films due to film block structure-Reference-Cited by-同舟云学术

Mobility restriction of charge carriers in bismuth films due to film block structure

Published:2011-02 Issue:1 Volume:5 Page:177-181
ISSN:1027-4510
Container-title:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Grabov V. M.,Demidov E. V.,Komarov V. A.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

Reference18 articles.

1. G. A. Ivanov and V. M. Grabov, Fiz. Tekh. Poluprovodn. 29, 1040 (1995) [Semiconductors 29, 538 (1995)].

2. Yu. F. Komnik, Physics of Metal Films. Size and Structure Effects (Atomizdat, Moscow, 1979) [in Russian].

3. V. M. Kosevich, L. S. Palatnik, S. I. Shevchenko, and V. A. Antonova, Fiz. Tverd. Tela 4, 3240 (1964) [Sov. Phys. Solid State 4, 2372 (1964)].

4. L. S. Palatnik, M. Ya. Fuks, and V. M. Kosevich, Mechanism of Formation and the Structure of Condensed Films (Nauka, Moscow, 1972) [in Russian].

5. L. S. Palatnik, P. G. Cheremskoi, and M. Ya. Fuks, Pores in Films (Energoizdat, Moscow, 1982) [in Russian].

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5. Structural Surface Features of Tellurium-Doped Bismuth Films;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2019-11