Kinetics of aggregations of F 2, F 3, X, and colloid centers in LiF/Si(111) films upon low-temperature annealing-Reference-Cited by-同舟云学术

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Kinetics of aggregations of F 2, F 3, X, and colloid centers in LiF/Si(111) films upon low-temperature annealing

Published:2013-01 Issue:1 Volume:7 Page:195-199
ISSN:1027-4510
Container-title:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Sharopov U. B.,Atabaev B. G.,Djabberganov R.,Kurbanov M. K.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

http://link.springer.com/content/pdf/10.1134/S1027451012120117.pdf

Reference9 articles.

1. B. G. Atabaev, S. Gaipov, and U. B. Sharopov, Poverkhnost’, No. 10, 52 (2007).

2. R. M. Montereali, Rad. Eff. Defects Solids 157, 545 (2002).

3. M. J. Weber, Handbook of Lasers (CRC Press, Washington, 2001), p. 235.

4. S. Scaglione, R. M. Montereali, V. Mussi, and E. Nichelatti, Optoelectron. Adv. Mater. 7, 207 (2005).

5. J. G. Roberts, M. A. van Hove, and G. A. Somorjai, Surf. Sci. 518, 49 (2002).

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