Author:
Speshilova A. B.,Solov’ev Yu. V.,Alexandrov S. E.
Subject
General Chemical Engineering,General Chemistry
Reference8 articles.
1. Varadan, V.K., Vinoy, K.J., and Jose, K.A., RF MEMS and Their Applications, Wiley, 2002.
2. Alexandrov, S.E., Speshilova, A.B., Soloviev, Y.V., and Eremeychik, O.I., Semiconductors, 2007, vol. 41, no. 4, pp. 469–472.
3. Moreau, W.M., Semiconductor Lithography: Principles, Practices, and Materials, Springer, 1988.
4. NIST National Institute of Standards and Technologies Atomic Spectra Database. www.nist.gov.
5. Breitbarth, F.-W., Ducke, E., and Tiller, H.-J., Plasma Chem. Plasma Proc., 1990, vol. 10, no. 3, pp. 377–399.
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