Preparation of boron microcrystals via high-pressure, high-temperature pyrolysis of decaborane, B10H14
Author:
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering
Link
http://link.springer.com/content/pdf/10.1134/S0020168511110069.pdf
Reference13 articles.
1. Nakamura, K., Preparation and Properties of Amorphous Boron Films Deposited by Pyrolysis of Decaborane in the Molecular Flow Region, J. Electrochem. Soc., 1984, vol. 131, no. 11, pp. 2691–2697.
2. Kamimura, K., Nagaoka, T., Shinomiya, T., et al., Preparation and Properties of Boron Thin Films, Thin Solid Films, 1999, vols. 343–344, pp. 342–344.
3. Kamimura, K., Yoshimura, T., Nagaoka, T., et al., Preparation and Thermoelectric Property of Boron Thin Film, J. Solid State Chem., 2000, vol. 154, no. 1, pp. 153–156.
4. Kodama, H., Oyaidzu, M., Sasaki, M., et al., Studies on Structural and Chemical Characterization for Boron Coating Films Deposited by PCVD, J. Nucl. Mater., 2004, vols. 329–333, pp. 889–893.
5. Nakano, S., Hemley, R.J., Gregoryanz, E.A., et al., Pressure Induced Transformations of Molecular Boron Hydride, J. Phys.: Condens. Matter, 2002, vol. 14, no. 44, pp. 10 453–10 456.
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