Preparation and properties of boron thin films-Reference-Cited by-同舟云学术

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Preparation and properties of boron thin films

Published:1999-04 Issue: Volume:343-344 Page:342-344
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kamimura Kiichi,Nagaoka Takeji,Shinomiya Toshio,Nakao Masato,Onuma Yoshiharu,Makimura Mika

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Preparation and Properties of Boron Thin Films

2. Boron thermistors

3. The chemical vapor deposition of boron at low temperatures

4. Preparation and Properties of Amorphous Boron Films Deposited by Pyrolysis of Decaborane in the Molecular Flow Region

5. On the Conductivity Mechanism of β-Rhombohedral Boron

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation and characterization of nanoboron for slurry fuel applications;Advanced Powder Technology;2020-05

2. Hot Filament Chemical Vapor Deposition of Crystalline Boron Films;Journal of the Korean Ceramic Society;2019-05-31

3. A review on the methods of preparation of elemental boron;Asia-Pacific Journal of Chemical Engineering;2015-04-20

4. Preparation of boron microcrystals via high-pressure, high-temperature pyrolysis of decaborane, B10H14;Inorganic Materials;2011-10-08

5. High-pressure high-temperature synthesis and structure of α-tetragonal boron;Science and Technology of Advanced Materials;2011-10

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