Author:
Naz M. Y.,Shukrullah S.,Ghaffar A.,Rehman N. U.,Khan Y.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics
Reference17 articles.
1. A. Grill, Cold Plasma in Materials Fabrication (IEEE Press, New York, 1993).
2. F. F. Chen, Plasma Diagnostic Techniques (Academic Press, New York, 1965).
3. K. T. Hwang, S. J. Oh, I. J. Choi, and C. W. Chung, “Measurement of Electron Temperature and Ion Density Using the Self-Bias Effect in Plasmas,” Phys. Plasmas 17, 063501 (2010).
4. S. H. Jang, G. H. Kim, and C. W. Chung, “In Situ Method for Real Time Measurement of Dielectric Film Thickness in Plasmas,” J. Appl. Phys. 107, 023303 (2010).
5. M. A. Sobolewski, “Measuring the Ion Current in High-Density Plasmas Using Radio-Frequency Current and Voltage Measurements,” J. Appl. Phys. 90, 2660–2671 (2001).
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