Energy and Transport Lengths for Describing Volume of Resist Modification in Ion-Beam Lithography-Reference-Cited by-同舟云学术

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Energy and Transport Lengths for Describing Volume of Resist Modification in Ion-Beam Lithography

Published:2022-08 Issue:4 Volume:16 Page:605-610
ISSN:1027-4510
Container-title:Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Surf. Investig.

Author:

Shabelnikova Ya. L.,Zaitsev S. I.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

https://link.springer.com/content/pdf/10.1134/S1027451022040310.pdf

Reference30 articles.

1. M. Komuro, N. Atoda, and H. Kawakatsu, J. Electrochem. Soc.: Solid State Sci. Technol. 126, 483 (1979). https://doi.org/10.1149/1.2129067

2. R. L. Kubena, J. W. Ward, F. P. Stratton, R. J. Joyce, and G. M. Atkinson, J. Vac. Sci. Technol. B 9, 3079 (1991). https://doi.org/10.1116/1.585373

3. G. M. Mladenov, M. Braun, B. Emmoth, and J. P. Biersack, J. Appl. Phys. 58, 2534 (1985). https://doi.org/10.1063/1.335932

4. D. Winston, J. Ferrera, L. Battistella, A. E. Vladar, and K. K. Berggren, Scanning 34, 121 (2012). https://doi.org/10.1002/sca.20290

5. J. Melngailis, J. Vac. Sci. Technol. B 5, 469 (1998). https://doi.org/10.1116/1.583937

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