Peculiarities of the Processing of Polycrystalline AlN Films on Glass-Ceramic and Si Substrates by Argon Cluster Ions-Reference-Cited by-同舟云学术

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Peculiarities of the Processing of Polycrystalline AlN Films on Glass-Ceramic and Si Substrates by Argon Cluster Ions

Published:2022-08 Issue:4 Volume:16 Page:480-483
ISSN:1027-4510
Container-title:Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Surf. Investig.

Author:

Nikolaev I. V.,Korobeishchikov N. G.,Geydt P. V.,Chirikov N. A.,Strunin V. I.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

https://link.springer.com/content/pdf/10.1134/S1027451022040152.pdf

Reference15 articles.

1. Y. Q. Fu, J. K. Luo, N. T. Nguyen, et al., Prog. Mater. Sci. 89, 31 (2017). https://doi.org/10.1016/j.pmatsci.2017.04.006

2. J. Kischkat, S. Peters, B. Gruska, et al., Appl. Opt. 51, 6789 (2012). https://doi.org/10.1364/AO.51.006789

3. V. S. Kudyakova, R. A. Shishkin, A. A. Elagin, et al., J. Eur. Ceram. Soc. 37, 1143 (2017). https://doi.org/10.1016/j.jeurceramsoc.2016.11

4. N. A. Bert, A. D. Bondarev, V. V. Zolotarev, et al., Semiconductors 49, 1383 (2015). https://doi.org/10.1134/S1063782615100036

5. N. Toyoda and I. Yamada, AIP Conf. Proc. 866, 210 (2006). https://doi.org/10.1063/1.2401497

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