Ranges of implanted atoms under polyatomic cluster bombardment of the Cu (111) surface

Author:

Zhurkin E. E.,Kosmach V. F.,Kolesnikov A. S.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Reference26 articles.

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3. ToF-SIMS: Surface Analysis by Mass Spectrometry, Ed. by J. C. Vickerman and D. Briggs (IM Publ., Chichester, UK, 2001).

4. M. A. Foad, R. Webb, R. Smith, et al., J. Vac. Sci. Technol. B 18, 445 (2000).

5. J. A. Davis, Ion Implantation and Beam Technology, Ed. by J. S. Williams and J. M. Pout (Naukova Dumka, Kiev, 1988), p. 72 [in Russian].

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