A Gas-Discharge Sputtering Device Based on a Planar Magnetron with an Ion Source-Reference-Cited by-同舟云学术

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A Gas-Discharge Sputtering Device Based on a Planar Magnetron with an Ion Source

Published:2020-09-23 Issue:5 Volume:63 Page:782-786
ISSN:0020-4412
Container-title:Instruments and Experimental Techniques
language:en
Short-container-title:Instrum Exp Tech

Author:

Semenov A. P.,Semenova I. A.,Tsyrenov D. B.-D.,Nikolaev E. O.

Publisher

Pleiades Publishing Ltd

Subject

Instrumentation

Link

https://link.springer.com/content/pdf/10.1134/S0020441220050218.pdf

Reference21 articles.

1. Danilin, B.S. and Syrchin, V.K., Magnetronnye raspylitel’nye sistemy (Magnetron Sputtering Systems), Moscow: Radio i Svyaz’, 1982.

2. Belyanin, A.F., Pashchenko, P.V., and Semenov, A.P., Prib. Tekh. Eksp., 1991, no. 3, p. 220.

3. Raizer, Yu.P., Fizika gazovogo razryada (Physics of Gas Discharge), Moscow: Nauka, 1987.

4. Semenov, A.P. and Batuev, B.-Sh.Ch., Prib. Tekh. Eksp., 1991, no. 5, p. 192.

5. Mesyats, G.A., Impul’snaya energetika i elektronika (Pulse Power Engineering and Electronics), Moscow: Nauka, 2004.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Gas Discharge Device Based on a Planar Magnetron and a Plasma Ion Source;Bulletin of the Russian Academy of Sciences: Physics;2023-12

2. Effects of a modified argon glow plasma source on PET polymeric surface properties;Emerging Materials Research;2023-06-01

3. Planar Magnetron with Rotary Central Anode Sputtered by an Ion Beam;Instruments and Experimental Techniques;2023-02

4. Physical Sputtering of a Copper Anode of a Planar Magnetron by a Beam of Accelerated Argon Ions with an Energy of 1–10 keV;Instruments and Experimental Techniques;2021-07

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