Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film-Reference-Cited by-同舟云学术

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Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film

Published:2021-12-24 Issue: Volume: Page:
ISSN:0030-400X
Container-title:Optics and Spectroscopy
language:en
Short-container-title:Opt. Spectrosc.

Author:

Kruchinin V. N.,Volodin V. A.,Rykhlitskii S. V.,Gritsenko V. A.,Posvirin I. P.,Shi Xiaoping,Baklanov M. R.

Publisher

Pleiades Publishing Ltd

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://link.springer.com/content/pdf/10.1134/S0030400X21050088.pdf

Reference30 articles.

1. R. H. Havemann and J. A. Hutchby, Proc. IEEE 89, 586 (2001).

2. K. Maex, M. R. Baklanov, D. Shamiryan, F. Iacopi, S. H. Brongersma, and Z. S. Yanovitskaya, J. Appl. Phys. 93, 8793 (2003).

3. Chap. 5;M. R. Baklanov,2016

4. A. Grill, Ann. Rev. Mater. Res. 39, 49 (2009).

5. Z. Ming, H. Deng, S. Y. Xie, and B. Zhang, Mater. Sci. Semicond. Process. 39, 235 (2015).

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