E-Beam Lithography Simulation Techniques
Author:
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/content/pdf/10.1134/S1063739720010096.pdf
Reference79 articles.
1. Chang, T.H.P., Proximity effect in electron-beam lithography, J. Vac. Sci. Technol., 1975, vol. 12, no. 6, pp. 1271–1275.
2. Umbach, C.P. and Broers, A.N., Proximity effect in electron beam patterned X-ray masks, Appl. Phys. Lett., 1990, vol. 56, no. 16, pp. 1594–1596.
3. Soe, E., Choi, B.K., and Kim, O., Determination of proximity effect parameters and the shape bias parameter in electron beam lithography, Microelectron. Eng., 2000, vol. 53, no. 1, pp. 305–308.
4. Dapor, M., Electron-Beam Interactions with Solids, Berlin, Heidelberg, New York: Springer, 2003.
5. Sheikin, E.G., Model differential cross section of elastic scattering of electrons by atoms in the Monte Carlo simulation of the passage of electrons in a substance, Tech. Phys., 2010, vol. 55, no. 1, pp. 1–9.
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