Subject
General Engineering,General Materials Science
Reference13 articles.
1. Suntola, T., Atomic layer epitaxy, Mater. Sci. Rep., 1989, vol. 4, pp. 261–312.
2. Miikkulainen, V., Leskela, M., Ritala, M., and Puurunen, R.L., Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends, J. Appl. Phys., 2013, vol. 113, pp. 021301–021401.
3. Puurunen, R.L., Surface chemistry of atomic layer deposition: A case of study for the trimethylaluminum water process, J. Appl. Phys., 2005, vol. 97, pp. 121301–121356.
4. Seidel, T., Londergan, A., and Winkler, L., Progress and opportunities in atomic layer deposition, Solid State Technol., 2003, no. 5, pp. 67–71.
5. Aleskovskii, V.B., Chemical assembling of materials, Vestn. Akad. Nauk SSSR, 1975, no. 6, pp. 48–54.
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献