Analysis and inhibition of progressive photomask contamination in long-term use for liquid-crystal panel production

Author:

Yanagita Yoshinori,Kaneko Yasushi,Abe Yasuyuki,Ogawa Hiroshi,Takayama Shigeki,Shinchi Hiroyuki,Tsuchiya Masayoshi,Murai Makoto

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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3. J. Leeet al., “Investigation of subpellicle defect formation at Krf lithography,”Proc. SPIE 5446, 231–237 (2004).

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5. M. Nakahara, in:New Course in Experimental Chemistry, edited by the Chemical Society of Japan (Maruzen, Tokyo, 1977), Vol. 8, Chap. 12, pp. 1101–1105.

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