Influence of thinSiO2interlayers on chemical reaction and microstructure at the Ni/Si(111) interface
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.33.5517/fulltext
Reference23 articles.
1. Electronic states and microstructure at the silicide-silicon interface
2. Microscopic properties and behavior of silicide interfaces
3. Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-NiSi2Epitaxial Structures
4. Correlation of Schottky-Barrier Height and Microstructure in the Epitaxial Ni Silicide on Si(111)
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