Electron emission from ion-bombardedSiO2thin films
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.49.1789/fulltext
Reference30 articles.
1. Electron and ion currents relevant to accurate current integration in MeV ion backscattering spectrometry
2. Plasma‐surface interactions: The role of charged particle emission
3. The influence of electron emission at the divertor target of a tokamak fusion reactor
4. Theory of Secondary Electron Emission by High-Speed Ions
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