Semiconductor surface diffusion: Effects of low-energy ion bombardment
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.63.125317/fulltext
Reference41 articles.
1. Ion energy, ion flux, and ion mass effects on low‐temperature silicon epitaxy using low‐energy ion bombardment process
2. Synthesis of epitaxial SnxGe1−x alloy films by ion‐assisted molecular beam epitaxy
3. Transmission electron microscopy investigation of biaxial alignment development in YSZ films fabricated using ion beam assisted deposition
4. Effect of N+2 ion bombardment on the compositional change and residual stress of AlN film synthesized by ion beam assisted deposition
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