Ultraviolet-induced chemical vapor deposition of silica films studied by surface-sensitive multiple-internal-reflection spectroscopy
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.47.4327/fulltext
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1. Surface Characterization;Analytical Chemistry;1995-06-15
2. Investigation of some physical properties of thin films by x-ray reflectivity;Physica Scripta;1994-08-01
3. Combined photochemical processes for silicon technology: substrate cleaning, silicon dioxide deposition and annealing;Applied Surface Science;1994-08
4. Accurate Measurements of the Density of Thin Silica Films;Europhysics Letters (EPL);1994-05-01
5. Influence of pressure on nitrogen incorporation in ultraviolet chemical vapor deposited SiO2films;Journal of Applied Physics;1993-11
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