Auger-electron-spectroscopy analysis of a plasmon loss in palladium silicide formed from Pd deposits on silicon
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.36.7422/fulltext
Reference12 articles.
1. Edge region hydrogen line emission in the PDX tokamak
2. The Effects of Interfacial SiO2 on Pd2Si Formation
3. Interaction of gold, palladium and Au-Pd alloy deposits with oxidized Si(100) substrates
4. Temperature dependence of AuPd thin film alloy contact formation on oxidized silicon substrates
5. Chemical bonding and reactions at the Pd/Si interface
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1. Interfacial Silicide Formation and Stress Evolution during Sputter Deposition of Ultrathin Pd Layers on a-Si;ACS Applied Materials & Interfaces;2019-09-24
2. Silica-Based Catalyst Supports Are Inert, Are They Not?: Striking Differences in Ethanol Decomposition Reaction Originated from Meso- and Surface-Fine-Structure Evidenced by Small-Angle X-ray Scattering;The Journal of Physical Chemistry C;2017-02-27
3. Electronic properties of W-encapsulated Si cluster film on Si (100) substrates;Journal of Applied Physics;2012-03-15
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5. Understanding silica-supported metal catalysts: Pd/silica as a case study;Catalysis Today;2003-10-15
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