Depth-dependent disordering ina-Si produced by self-ion-implantation
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.50.17080/fulltext
Reference18 articles.
1. Defect production and annealing in ion-implanted amorphous silicon
2. Structural relaxation and defect annihilation in pure amorphous silicon
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4. Ion-beam-induced damage in silicon studied using variable-energy positrons, Rutherford backscattering, and infrared absorption
5. Transient structural relaxation of amorphous silicon
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