Time-resolved pinhole camera imaging and extreme ultraviolet spectrometry on a hollow cathode discharge in xenon
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.68.056403/fulltext
Reference11 articles.
1. Extreme-ultraviolet sources for lithography applications
2. A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography
3. Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency
4. Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
5. Quantum efficiency of opaque CsI photocathodes with channel electron multiplier arrays in the extreme and far ultraviolet
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