Lattice Location and Stability of Ion Implanted Cu in Si
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.84.1495/fulltext
Reference28 articles.
1. Electrical properties and recombination activity of copper, nickel and cobalt in silicon
2. Copper in silicon
3. Intrinsic Diffusion Coefficient of Interstitial Copper in Silicon
4. Diffusion and Solubility of Copper in Extrinsic and Intrinsic Germanium, Silicon, and Gallium Arsenide
5. Transition metals in silicon
Cited by 61 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Structure Analysis Using Time-of-Flight Momentum Microscopy with Hard X-rays: Status and Prospects;Journal of the Physical Society of Japan;2022-09-15
2. Revisiting the stable structure of the Cu4 complex in silicon;Japanese Journal of Applied Physics;2021-01-12
3. Emitter-site specificity of hard x-ray photoelectron Kikuchi-diffraction;New Journal of Physics;2020-10-01
4. An ab initio study on the transport characteristics of Si2C2 clusters;Canadian Journal of Physics;2020-01
5. Thermal stability of Te-hyperdoped Si: Atomic-scale correlation of the structural, electrical, and optical properties;Physical Review Materials;2019-04-26
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3