Pressure-induced metallization and the collapse of the magnetic state in the antiferromagnetic insulatorNiI2-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Pressure-induced metallization and the collapse of the magnetic state in the antiferromagnetic insulatorNiI2

Published:1990-08-06 Issue:6 Volume:65 Page:790-793
ISSN:0031-9007
Container-title:Physical Review Letters
language:en
Short-container-title:Phys. Rev. Lett.

Author:

Pasternak Moshe P.,Taylor R. Dean,Chen Anthony,Meade Charles,Falicov L. M.,Giesekus Andreas,Jeanloz Raymond,Yu Peter Y.

Publisher

American Physical Society (APS)

Subject

General Physics and Astronomy

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.65.790/fulltext

Reference21 articles.

1. New Approach to the Theory of Superexchange Interactions

2. “Influence of valence instabilities on the Curie-temperature of ferromagnetic 4f-systems”

3. Valence fluctuations in ferromagnetic 4fsystems

Cited by 87 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pressure-induced semiconductor to metal transition and its impact on the electronic, optical, and thermodynamic properties of the new Kitaev spin liquid candidate CoI2;Materials Chemistry and Physics;2024-08

2. Phase Transitions Under High Pressures;High Pressure Physics;2024

3. High-pressure behavior of the magnetic van der Waals molecular framework Ni(NCS)2;Physical Review B;2023-10-31

4. High-pressure studies of atomically thin van der Waals materials;Applied Physics Reviews;2023-03-01

5. Electrical Interrogation of Thickness‐Dependent Multiferroic Phase Transitions in the 2D Antiferromagnetic Semiconductor NiI₂;Advanced Functional Materials;2023-01-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3