Influence of the Angular Distribution Function of Incident Particles on the Microstructure and Anomalous Scaling Behavior of Thin Films
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.96.236101/fulltext
Reference21 articles.
1. Mesoscopic Physics of Complex Materials
2. Dynamics of Rough Interfaces in Chemical Vapor Deposition: Experiments and a Model for Silica Films
3. Surface transport kinetics in low-temperature silicon deposition determined from topography evolution
4. Growth front roughening in silicon nitride films by plasma-enhanced chemical vapor deposition
5. Rapid Roughening in Thin Film Growth of an Organic Semiconductor (Diindenoperylene)
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