Pattern of Si(100): Spontaneous etching withBr2
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.71.4154/fulltext
Reference17 articles.
1. Surface science aspects of etching reactions
2. Reaction mechanisms for the photon-enhanced etching of semiconductors: An investigation of the UV-stimulated interaction of chlorine with Si(100)
3. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)
4. Semiconductor surface etching by halogens: Fundamental steps
5. First-principles-derived dynamics of a surface reaction: Fluorine etching of Si(100)
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