Initial Process of Si Homoepitaxial Growth on Si(001)
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.76.2949/fulltext
Reference24 articles.
1. Scanning tunneling microscopy study of diffusion, growth, and coarsening of Si on Si(001)
2. Anisotropy in surface migration of Si and Ge on Si(001)
3. Growth and equilibrium structures in the epitaxy of Si on Si(001)
4. Surface self-diffusion of Si on Si(001)
5. Si Binding and Nucleation on Si(100)
Cited by 106 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Temperature behaviour of the average size of nanoparticle lattices co-deposited with an amorphous matrix. Analysis of Ge + Al2O3and Ni + Al2O3thin films;Journal of Physics: Condensed Matter;2017-09-15
2. Self-Organized Two-DimensionalVidro-NanodotArray on Laser-Irradiated Si Surface;Applied Physics Express;2011-05-09
3. Challenges of introducing quantitative elementary reactions in multiscale models of thin film deposition;physica status solidi (b);2010-06-18
4. Si atom adsorption and diffusion on Si(110)-(1×1)and(2×1);Physical Review B;2010-04-29
5. New tetramer structures in the initial process of Si homoepitaxial growth on Si (001);Applied Surface Science;2009-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3