Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit-Reference-Cited by-同舟云学术

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Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

Published:2000-09-25 Issue:13 Volume:85 Page:2733-2736
ISSN:0031-9007
Container-title:Physical Review Letters
language:en
Short-container-title:Phys. Rev. Lett.

Author:

Boto Agedi N.,Kok Pieter,Abrams Daniel S.,Braunstein Samuel L.,Williams Colin P.,Dowling Jonathan P.

Publisher

American Physical Society (APS)

Subject

General Physics and Astronomy

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.85.2733/fulltext

Reference23 articles.

1. Pattern generation for the next millennium

2. Interferometric lithography — from periodic arrays to arbitrary patterns

3. XXXI. Investigations in optics, with special reference to the spectroscope

4. Principles of Optics

5. Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure

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