Pattern generation for the next millennium-Reference-Cited by-同舟云学术

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Pattern generation for the next millennium

Published:1997-02 Issue:1-4 Volume:35 Page:501-507
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Hawryliw Andre

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Workshop: Working Group Reports;Semiconductor Industry Association,1993

2. 14th Annual Symposium on Photomask Technology and Management,1994

3. Wafer Requirements in the Year 2000;Brown,1994

4. Annual Proceedings,1993

5. “64 to 256 Megabit Reticle Generation”, Ed. G Hearn, SPIE Review, Vol CR51.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electromagnetic field distribution modelling in microlenses fabrication process;Journal of Physics and Chemistry of Solids;2007-05

2. Correlation between magnetization performance and magnetic microstructure of patterned permalloy films fabricated by microcontact printing;Journal of Applied Physics;2004-11

3. Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit;Physical Review Letters;2000-09-25

4. Integrated eyeball-tracking device;Optoelectronic Materials and Devices II;2000-07-11

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