Author:
Kurunczi P. F.,Guha J.,Donnelly V. M.
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Cited by
23 articles.
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1. Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-05
2. Chamber wall interactions with HBr/Cl2/O2 plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-07
3. A dominant role of oxygen additive on cold atmospheric-pressure He + O-2 plasmas;PHYS PLASMAS;2014
4. Effect of titanium contamination on oxygen atom recombination probability on plasma conditioned surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-11
5. Plasma etching: Yesterday, today, and tomorrow;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-09