Author:
Herman I. P.,Donnelly V. M.,Guinn K. V.,Cheng C. C.
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Cited by
41 articles.
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1. Plasma etching: Yesterday, today, and tomorrow;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-09
2. Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-09
3. Perspectives in nanoscale plasma etching: what are the ultimate limits?;Journal of Physics D: Applied Physics;2011-04-14
4. Critical review: Plasma-surface reactions and the spinning wall method;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-01
5. Dilute hydrogen plasma cleaning of boron from silicon after etching of HfO2 films in BCl3 plasmas: Substrate temperature dependence;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-01