Structural, electrical, and vibrational properties of Ti-H and Ni-H complexes in Si

Author:

Backlund D. J.,Estreicher S. K.

Publisher

American Physical Society (APS)

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Radiation defects as probes for the copper and nickel contamination during the chemomechanical polishing of Si wafers;Materials Science in Semiconductor Processing;2024-01

2. Nucleation of Nickel Disilicide Precipitates in Float‐Zone Silicon: The Role of Vacancies;physica status solidi (a);2022-07-14

3. Ag and Ag–Cu interactions in Si;Journal of Applied Physics;2020-10-21

4. The Cu photoluminescence defect and the early stages of Cu precipitation in Si;Journal of Applied Physics;2020-02-24

5. Modeling of Metal Properties in Si, Si1−xGex and Ge;Metal Impurities in Silicon- and Germanium-Based Technologies;2018

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3