Role of fast sputtered particles during sputter deposition: Growth of epitaxialGe0.99C0.01/Ge(001)
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.62.11203/fulltext
Reference25 articles.
1. Structure Modification by Ion Bombardment during Deposition
2. Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition
3. Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering
4. Generation and nucleation of adatoms during ion bombardment of Pt(111)
5. Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering
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