Topographic evolution during deposition of plasma-deposited hydrogenated silicon on glass
Author:
Publisher
American Physical Society (APS)
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.72.205305/fulltext
Reference29 articles.
1. Fractal Concepts in Surface Growth
2. Surface transport kinetics in low-temperature silicon deposition determined from topography evolution
3. Surface Roughness Evolution of PECVD Cathodic and Anodic a-Si:H.
4. Growth mechanism of hydrogenated amorphous silicon studied by in situ scanning tunneling microscopy
5. Morphological study of kinetic roughening on amorphous and microcrystalline silicon surface
Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The effect of pretreatment for SiH 4 gas by microwave plasma on Si film formation behavior by thermal CVD;Plasma Processes and Polymers;2020-01-27
2. Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD;Plasma and Fusion Research;2019-09-09
3. Variable roughness development in statically deposited SiO2 thin films: a spatially resolved surface morphology analysis;Journal of Physics D: Applied Physics;2018-06-25
4. Growth kinetics of ion beam sputtered Al-thin films by dynamic scaling theory;Thin Solid Films;2014-12
5. Impact of microcrystalline-silicon surface-morphology on film quality and solar cell performance;Japanese Journal of Applied Physics;2014-08-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3