Reinvestigation of the Ni/Si interface: Spectromicroscopic evidence for multiple silicide phases
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.57.R6799/fulltext
Reference19 articles.
1. Growth and characterization of epitaxial Ni and Co silicides
2. Bulk versus Surface Transport of Nickel and Cobalt on Silicon
3. Transition metal induced ring‐cluster structures on Si(111)
4. Formation conditions and atomic structure of the Si(111)-√19 Ni surface
5. Growth and annihilation of nickel silicide studied by scanning tunneling microscopy
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2. Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates;Materials Letters;2014-02
3. Synchrotron-based photoelectron microscopy;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2009-03
4. Kinetics of NiSi-to-NiSi2 transformation and morphological evolution in nickel silicide thin films on Si(001);Acta Materialia;2006-10
5. Formation of transition metal silicides by high energy ion beam mixing in Mn/Si and Ni/Si single and multilayer samples;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-06
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